PROCESS FOR FABRICATING FIN-TYPE FIELD EFFECT TRANSISTOR (FinFET) STRUCTURE

ABSTRACT

A process for fabricating a fin-type field effect transistor (FinFET) structure is described. A semiconductor substrate is patterned to form a fin. A spacer is formed on the sidewall of the fin. A portion of the fin is removed, such that the spacer and the surface of the remaining fin together define a cavity. A piece of a semiconductor compound is formed from the cavity, wherein the upper portion of the piece of the semiconductor compound laterally extends over the spacer.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a divisional application of and claims the priority benefit of U.S. application Ser. No. 14/042,190 filed on Sep. 30, 2013, now allowed. The entirety of each of the above-mentioned patent applications is hereby incorporated by reference herein and made a part of specification.

BACKGROUND OF THE INVENTION

1. Field of Invention

This invention relates to a semiconductor process and a product thereof, and more particularly relates to a process for fabricating a fin-type field effect transistor (FinFET) structure, and a FinFET structure fabricated through the process.

2. Description of Related Art

A FinFET typically includes a semiconductor fin, a gate crossing over the fin to form a tri-gate structure, and a source and a drain beside the portion of the fin under the gate. In a strained silicon process applied to FinFET, the portions of the fin not under the gate are recessed after the gate is formed, and a semiconductor compound having a lattice parameter different from that of the material of the fin is grown based on the recessed portions of the fin to serve as a source and a drain.

However, because the piece of the semiconductor compound grown based on the recessed portions of a fin grows also in the lateral direction, it may contact with a piece of the semiconductor compound on a neighboring fin to cause a short circuit. Though increasing the distance between two neighboring fins in such a process is capable of preventing a short circuit, the integration degree of devices is reduced by doing so.

SUMMARY OF THE INVENTION

In view of the foregoing, this invention provides a process for fabricating a fin-type field effect transistor (FinFET) structure.

This invention also provides a FinFET structure that can be fabricated through the process of this invention.

According to an aspect of this invention, the process for fabricating a FinFET structure of this invention includes the following step. A semiconductor substrate is patterned to form a plurality of fins. A gate dielectric layer is formed on the surfaces of the fins. The gate dielectric layer is trimmed to reduce the thickness thereof. A spacer material layer is formed on the trimmed gate dielectric layer.

In an embodiment of the above aspect of this invention, the step of trimming the gate dielectric layer includes a dry or wet etching step.

According to another aspect of this invention, the process for fabricating a FinFET structure of this invention includes the following step. A semiconductor substrate in a first area is patterned to form a first fin. A first spacer is formed on the sidewall of the first fin. A portion of the first fin is removed, such that the first spacer and the surface of the remaining first fin define a first cavity. A piece of a first semiconductor compound is formed from the first cavity, wherein the upper portion of the piece of the first semiconductor compound laterally extends over the first spacer.

In an embodiment of another aspect of this invention, the process further includes the following step. The substrate in a second area is patterned to form a second fin. A second spacer is formed on the sidewall of the second fin. A portion of the second fin is removed, such that the second spacer and the surface of the remaining second fin define a second cavity. A piece of a second semiconductor compound is formed from the second cavity, wherein the upper portion of the piece of the second semiconductor compound laterally extends over the second spacer.

In the above process of this invention, since the gate dielectric layer is trimmed to reduce the thickness thereof before the spacer material layer is formed, the portions of the spacer material layer on neighboring fins will not merge later, so the spacer material formed over the fins will not be overly thick. In addition, the thinned gate dielectric layer on the top of the fin is easier to remove. As a result, the cavity formed by partial removal of the fin for forming the semiconductor compound is allowed to have a sufficient depth, so that the volume and the strain of the formed semiconductor compound will be sufficient.

Moreover, since the semiconductor compound is formed from the cavity defined by the surface of the remaining fin and the spacer, the lower portion of the piece of the semiconductor compound is confined by the spacer, so the upper portions of the pieces of the semiconductor compound on neighboring fins will not contact with each other and the process margin can be increased.

In order to make the aforementioned and other objects, features and advantages of the present invention comprehensible, a preferred embodiment accompanied with figures is described in detail below.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1-11 illustrate, in a cross-sectional view, a process for fabricating a FinFET structure according to an embodiment of this invention, which is integrated with a fabrication process of ordinary strained CMOS devices, wherein FIG. 11 also illustrates a FinFET structure according to the embodiment of this invention.

DESCRIPTION OF EMBODIMENTS

It is noted that the following embodiment is intended to further explain this invention but not to limit the scope thereof. For example, though the semiconductor compound of the P-type FinFET is formed first in the embodiment, it is also possible to form the semiconductor compound of the N-type FinFET first in other embodiments. In such cases, it is possible that the first semiconductor compound comprises silicon phosphorous (SiP) and the second semiconductor compound comprises SiGe.

FIGS. 1-11 illustrate, in a cross-sectional view, a process for fabricating a FinFET structure according to an embodiment of this invention, which is integrated with a fabrication process of ordinary strained CMOS devices.

Referring to FIG. 1, a semiconductor substrate 100 is provided, which may be a single-crystal silicon substrate. The substrate 100 includes a FinFET area 102 and an ordinary device area 104. The FinFET area 102 includes a NMOS area 102 n and a PMOS area 102 p. The ordinary device area 104 includes a NMOS area 104 n and a PMOS area 104 p.

The substrate 100 in the FinFET area 102 is patterned to form a plurality of fins 100 a and 100 b, wherein the fins 100 a is in the PMOS area 102 p and the fins 100 b in the NMOS area 102 n. At the same time, the trench for forming the isolation layer 108 of the ordinary devices is formed in the substrate 100 in the ordinary device area 104. An insulating material, such as silicon dioxide, is then filled in between the fins 100 a in the PMOS FinFET area 102 p, in between the fins 100 b in the NMOS FinFET area 102 n, and in the trench in the ordinary device area 104 to form isolation layers 108. For easier reference of the subsequent steps and descriptions, the level of the top of the substrate 100 in the ordinary device area 104 and the tops of the fins 100 a and 100 b in the FinFET area 102 is marked by a dash line L1, and the level of the top of the isolation layer 108 in the FinFET area 102 is marked by a dash line L2.

A gate dielectric layer 110, which may include silicon oxide or a high-k material, is formed on the surfaces of the fins 100 a and 100 b exposed outside of the isolation layer 108 in the FinFET area 102 and on the substrate 100 in the ordinary device area 104. The thickness of the gate dielectric layer 110 may range from 30 Å to 60 Å.

Thereafter, a conductor layer 112, a first hard mask layer 114 and a second hard mask layer 116 are sequentially formed over the gate dielectric layer 110 and then patterned to form the gates 112 of the ordinary PMOS and NMOS devices and the gates (not seen in this cross section) of the P-type and N-type FinFETs. The conductor layer 112 may include, e.g., doped poly-Si. The first hard mask layer 114 and the second hard mask layer 116 include different materials, e.g., SiN and SiO, respectively.

Referring to FIG. 2, the exposed gate dielectric layer 110 is trimmed, possibly with a dry or wet etching step, to reduce the thickness thereof. The dry etching step may use the Siconi® pre-clean recipe, etc. The wet etching step may use dilute hydrofluoric acid (DHF), etc. The trimmed gate dielectric layer 110 a may have a thickness within the range of 10 to 30 Å.

Referring to FIG. 3, a patterned mask layer 120, which is usually a patterned photoresist layer, is formed covering the PMOS FinFET area 102 p and the ordinary PMOS area 104-p. Using the patterned mask layer 120 as a mask, an implant process 122 is then performed to the fins 100 b in the NMOS FinFET area 102 n and the substrate 100 in the ordinary NMOS area 104 n. The implant process 122 may include an N-type S/D extension implant step that forms S/D extension regions 124 a of the N-type FinFETs and S/D extension regions 124 b of the ordinary NMOS devices, or include an N-type S/D extension implant step and a P-type pocket implant step (the P-type pocket doped regions are not shown).

Referring to FIG. 4, the patterned mask layer 120 is removed, and then another patterned mask layer 126, which is also usually a patterned photoresist layer, is formed covering the NMOS FinFET area 102 n and the ordinary NMOS area 104 n. Using the patterned mask layer 126 as a mask, an implant process 128 is then performed to the fins 100 a in the PMOS FinFET area 102 p and the substrate 100 in the ordinary PMOS area 104 p. The implant process 128 may include a P-type S/D extension implant step that forms S/D extension regions 130 a of the P-type FinFET and S/D extension regions 130 b of the ordinary PMOS devices, or include a P-type S/D extension implant step and an N-type pocket implant step (the N-type pocket doped regions are not shown).

Referring to FIG. 5, the patterned mask layer 126 is removed, and then a blanket spacer material layer 134, which is substantially conformal with the above-resulting structure, is formed over the entire substrate. The material of the spacer material layer 134 is different from that of the gate dielectric layer 110 a, and may be SiN, for example. The thickness of the spacer material layer 134 may range from 80 Å to 130 Å.

Since the gate dielectric layer 110 has been trimmed to reduce the thickness thereof before the spacer material layer 134 is formed, the portions of the spacer material layer 134 on neighboring fins 100 a/b will not merge later, so the spacer material formed over the fins 100 a/b will not be overly thick. In addition, the thinned gate dielectric layer 110 a on the top of the fins 100 a/b is easier to remove. As a result, the cavities later formed by partial removal of the fins 100 a/b for forming the semiconductor compounds are allowed to have sufficient depths, so that the volume and the strain of the formed semiconductor compounds will be sufficient.

Referring to FIGS. 5-6, a patterned mask layer 136, which is usually a patterned photoresist layer, is formed covering the NMOS FinFET area 102 n and the ordinary NMOS area 104 n. The exposed portions of the spacer material layer 134 are then subjected to anisotropic etching, such that the portion in the ordinary PMOS area 104 p becomes a spacer 134 a on the sidewall of each gate 112 but the portion in the PMOS FinFET area 102 p in the area 102 is entirely removed due to its smaller height. The anisotropic etching is continued to remove the trimmed gate dielectric layer 110 a on the tops of the fins 100 a and on the surface of the substrate 100 in the PMOS area 104 p in the ordinary device area 104, and then remove a portion of each of the fins 100 a and a portion of the substrate 100 in the ordinary PMOS area 104 p to form cavities 138 a and 138 b in the PMOS FinFET area 102 p and the ordinary PMOS area 104 p, respectively.

The above process is controlled in a manner such that the trimmed gate dielectric layer 110 a on the sidewall of each fin 100 a is not entirely removed and a spacer 110 b is left behind, which extends upward over the remaining part of the fin 100 a. Thus, for each fin 100 a, the spacer 110 b and the surface of the remaining portion of the fin 100 a together define the cavity 138 a. The bottom of the cavity 138 a may be lower than the level L2 of the top of the isolation layer 108 (FIG. 1) in the FinFET area 102, in order to provide a sufficient volume for subsequent formation of the first semiconductor compound, which may be carried out with SiGe epitaxy.

Referring to FIG. 7, the patterned mask layer 136 is removed, and then a piece 140 a of a first semiconductor compound is formed from each cavity 138 a in the PMOS FinFET area 102 p and also a piece 140 b of the first semiconductor compound is formed from each cavity 138 b in the ordinary PMOS area 104 p. The first semiconductor compound may include SiGe, and may be formed with an epitaxial process, which may include in-situ P-type doping.

Since in the PMOS FinFET area 102 p the first semiconductor compound is formed from the cavity 138 a defined by the spacer 110 b and the remaining part of the fin 100 a, the lower portion of the piece 140 a of the first semiconductor compound is confined by the spacer 110 b, so that the upper portions of the pieces 140 a of the semiconductor compound on neighboring fins 100 a will not contact with each other to cause a short circuit and the process margin can be increased.

For example, in a case where the first semiconductor compound is formed by an epitaxial process, the spacer 110 b confines the lateral growth of the first semiconductor compound, so the first semiconductor compound is not allowed to grow laterally until growing outside of the cavity 138 a. Thus, even though the upper portion of each piece 140 a of the first semiconductor compound extends laterally over the spacer 110 b, the upper portions of the pieces 140 a of the first semiconductor compound on neighboring fins 100 a will not merge to cause short circuit.

Referring to FIG. 8, a blanket blocking layer 144 substantially conformal to the above-resulting structure is formed over the entire substrate. The material of the layer 144 may be the same as or different from that of the spacer material layer 134, such as SiN, SiCN, or SiN on SiO₂, and may have a thickness in the range of 40 to 80 Å.

Referring to FIGS. 8 and 9, a patterned mask layer 146, which is also usually a patterned photoresist layer, is formed covering the PMOS FinFET area 102 p and the ordinary PMOS area 104 p. The exposed portions of the blocking layer 144 are then removed. The exposed portions of the spacer material layer 134 and the trimmed gate dielectric layer 110 a are then subjected to anisotropic etching to form a spacer 134 b beside each gate 112 in the ordinary NMOS area 104 n and simultaneously form a spacer 134 c and a spacer 110 c on the sidewall of each fin 100 b in the NMOS FinFET area 102 n. The spacer 134 c and the spacer 110 c together serve as an aforementioned second spacer (the spacer 110 b serves as the first spacer). A portion of each fin 100 b and the exposed portions of the substrate 100 in the ordinary NMOS area 104 n are then removed to form cavities 148 a and cavities 148 b in the NMOS FinFET area 102 n and the ordinary NMOS area 104 n, respectively. The bottom of each cavity 148 a may be higher than the level L2 of the top of the isolation layer 108 (FIG. 1) in the FinFET area 102, so that each cavity 138 a from which the first semiconductor compound (e.g., SiGe) is formed (FIGS. 6-7) is deeper than each cavity 148 a. The reason/effect of such a design is of SiGe strain concern.

Referring to FIG. 10, the patterned mask layer 146 is removed, and then a piece 150 a of a second semiconductor compound is formed from each cavity 148 a in the NMOS FinFET area 102 n and also a piece 150 b of the second semiconductor compound is formed from each cavity 148 b in the ordinary NMOS area 104 n. The first semiconductor compound (140 a and 140 b) in the PMOS FinFET area 102 p and the ordinary PMOS area 104 p is not affected during the formation of the second semiconductor compound due to the blocking effect of the blocking layer 144. The second semiconductor compound may include silicon phosphorous (SiP), and may be formed with an epitaxial process.

Since in the NMOS FinFET area 102 n the second semiconductor compound is formed from the cavity 148 a defined by the spacer 110 c+134 c and the surface of the remaining part of the fin 100 b, the lower portion of the piece 150 a of the second semiconductor compound is confined by the spacer 110 c, so the upper portions of the pieces 150 a of the second semiconductor compound on neighboring fins 100 b will not contact with each other to cause a short circuit and the process margin can be increased.

For example, in case the second semiconductor compound is formed by epitaxy, the spacer 110 c+134 c will confine the lateral growth of the second semiconductor compound, so the second semiconductor compound is not allowed to grow laterally until growing outside of the cavity 148 a. Thus, even though the upper portion of each piece 150 a of the second semiconductor compound extends laterally over the spacer 110 c+134 c, the upper portions of the pieces 150 a of the second semiconductor compound on neighboring fins 100 b will not merge to cause short circuit.

Referring to FIG. 11, the blocking layer 144 is removed, possibly by wet etching.

FIG. 11 also illustrates a FinFET structure according to the embodiment of this invention. The FinFET structure of this invention includes first fins 100 a, first spacers 110 b and pieces of the first semiconductor compound 140 a in a PMOS area 102 p, and second fins 100 a, second spacers 110 c+134 c and pieces of the second semiconductor compound 150 a in a NMOS area 102 n.

In the PMOS FinFET area 102 p, each first spacer 110 b is disposed over the sidewall of a first fin 100 a, and extends upward to define, in combination with the first fin 100 a, a first cavity 138 a. The piece of the first semiconductor compound 140 a includes a lower portion in the first cavity 138 a, and an upper portion over the lower portion and laterally extending over the first spacer 110 b. The first semiconductor compound may be SiGe.

In the NMOS FinFET area 102 n, each second spacer 110 c+134 c, which includes a spacer 110 c coming from the gate dielectric layer possibly including silicon oxide and a spacer 134 c possibly including SiN, is disposed over the sidewall of a second fin 100 b, and extends upward to define, in combination with the second fin 100 b, a second cavity 148 a. The piece of the second semiconductor compound 150 a includes a lower portion in the first cavity 148 a, and an upper portion over the lower portion and laterally extending over the second spacer 110 c+134 c. The second semiconductor compound may be SiP. The first cavity 138 a from which the first semiconductor compound 140 a (e.g., SiGe) is formed may be deeper than the second cavity 148 a from which the second semiconductor compound 150 a (e.g., SiP).

This invention has been disclosed above in the preferred embodiments, but is not limited to those. It is known to persons skilled in the art that some modifications and innovations may be made without departing from the spirit and scope of this invention. Hence, the scope of this invention should be defined by the following claims. 

What is claimed is:
 1. A process for fabricating a fin-type field effect transistor (FinFET) structure, comprising: patterning a semiconductor substrate to form a plurality of fins; forming a gate dielectric layer on surfaces of the fins; trimming the gate dielectric layer to reduce a thickness thereof; and forming a spacer material layer on the trimmed gate dielectric layer.
 2. The process of claim 1, wherein the step of trimming the gate dielectric layer comprises a dry or wet etching step.
 3. The process of claim 1, wherein the trimmed gate dielectric layer has a thickness within a range of 30 Å to 60 Å.
 4. A process for fabricating a FinFET structure, comprising: patterning a semiconductor substrate in a first area to form a first fin; forming a first spacer on a sidewall of the first fin; removing a portion of the first fin, such that the first spacer and a surface of the remaining first fin together define a first cavity; and forming a piece of a first semiconductor compound from the first cavity, wherein an upper portion of the piece of the first semiconductor compound laterally extends over the first spacer.
 5. The process of claim 4, wherein the first semiconductor compound comprises SiGe, and the first spacer comprise silicon oxide.
 6. The process of claim 4, wherein the first semiconductor compound comprises silicon phosphorous (SiP), and the first spacer comprises a silicon oxide spacer on the sidewall of the first fin and a SiN spacer on a sidewall of the silicon oxide spacer.
 7. The process of claim 4, wherein the step of forming the first semiconductor compound comprises an epitaxial step.
 8. The process of claim 4, further comprising: patterning the semiconductor substrate in a second area to form a second fin; forming a second spacer on a sidewall of the second fin; removing a portion of the second fin, such that the second spacer and a surface of the remaining second fin together define a second cavity; and forming a piece of a second semiconductor compound from the second cavity, wherein an upper portion of the piece of the second semiconductor compound laterally extends over the second spacer.
 9. The process of claim 8, wherein the first semiconductor compound comprises SiGe, and the first spacer comprise silicon oxide.
 10. The process of claim 9, wherein the second semiconductor compound comprises silicon phosphorous (SiP), and the second spacer comprises a silicon oxide spacer on the sidewall of the second fin and a SiN spacer on a sidewall of the silicon oxide spacer.
 11. The process of claim 8, wherein the step of forming the first semiconductor compound comprises a first epitaxial step, and the step of forming the second semiconductor compound comprises a second epitaxial step.
 12. The process of claim 8, wherein the formations of the first spacer and the first cavity comprise: forming a first isolation structure around the first fin and a second isolation structure around the second fin; &inning a gate dielectric layer and a spacer material layer covering the first fin and the second fin; forming a first mask layer covering the second area; removing the spacer material layer in the first area with the first mask layer as a mask; anisotropically etching the gate dielectric layer in the first area to form the first spacer and expose a surface of the first fin; removing the portion of the first fin to form the first cavity; and removing the first mask layer.
 13. The process of claim 12, wherein the formations of the second spacer, the second cavity and the second semiconductor compound comprise: forming a blocking layer covering the first area and the second area; forming a second mask layer covering the first area; removing the blocking layer in the second area with the second mask layer as a mask; anisotropically etching the spacer material layer and the gate dielectric layer to expose the second fin; removing the portion of the second fin to form the second cavity; removing the second mask layer; forming the piece of the second semiconductor compound from the second cavity, wherein the upper portion of the piece of the second semiconductor compound laterally extends over the second spacer; and removing the blocking layer.
 14. The process of claim 13, wherein the first cavity is deeper than the second cavity. 